New frontiers of atomic layer etching
New frontiers of atomic layer etching
Mar 20, 2018
spiedigitallibrary.org
Atomic layer etching (ALE) offers chipmakers more than just the precise removal of targeted material — etching both directionally (in one direction) or isotopically (in all directions). Furthermore, features with different aspect ratios can be etched the same amount, minimizing or eliminating aspect ratio dependent etching (ARDE). We power ALE with products like Flex®. https://bit.ly/4lju9qx | Lam Research Corporation
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